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Occupational Exposure to Extremely Low-Frequency Magnetic Fields in Semiconductor Fabrication Rooms

Last modified on: Thursday, November 06, 2008 11:22:20
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Time-weighted average (TWA) exposures of semiconductor fabrication room (FAB) workers to extremely low-frequency (ELF) magnetic fields were modeled. None of the differences between the predicted and measured values were statistically significant but agreement was poor between predicted values and measured values for individual workers. This was attributed to unforeseen sources of ELF magnetic fields such as transformers or distribution panels, sources in adjacent rooms, or to errors in the subjects' judgments of time spent near the FAB devices. [BENER 13273]


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